The PAS 5500/350C is a Deep UV stepper for 0.15-µm applications and beyond.

The high productivity and low cost of ownership allow capacity extensions in existing DUV stepper fabs as well.

The PAS 5500/350C system provides a very cost-effective mix-and-match lithography solution when used in

conjunction with other ASML PAS 5500 i-line and DUV stepper

Key Features and Benefits

Variable 0.63-NA Deep UV Lens, Full Stepper Field

Production resolution down to 150 nm.

Continuously variable partial coherence and annular illumination

Fully automated imaging optimization for different process layers.

Beam delivery laser technology

Remote laser location to facilitate easy maintenance and safe operation.

Through-The-Lens (TTL) phase modulated alignment

For optimum overlay and matching simultaneous with industry-leading throughput.