Description

The PAS 5500/850C 248-nm Step-and-Scan system enables 110-nm mass production. Since the

initial introduction of the PAS 5500/850, the PAS 5500/850 series have become the worldwide

standard for both 110-nm logic and 110-nm memory applications.

The PAS 5500/850C can be configured with a number of options that enable ultra low-k 1 in

manufacturing, extending application of the PAS 5500/850C well below 110 nm.

Key Features and Benefits

Variable 0.8-NA Deep UV Projection Lens

Production resolution down to 110 nm.

AERIAL II Illuminator

Provides the ultimate flexibility in illumination modes at maximum throughput.

PAS 5500 Step-and-Scan Body

Commonality with i-line and 193-nm Step-and-Scan tools for economic mix-and-match.

ATHENA Advanced Alignment Combined With Reticle Blue Align

Increased alignment accuracy for a wide variety of processes. Ultra stable over time.

Includes 20-W KrF Laser Technology with Variable Laser Frequency Control

Combines high laser power for high throughput with efficient use of laser pulses for the lowest possible

laser cost of operation.

Batch Streaming with ARMS

Provides continuous-flow manufacturing.