AMAT P5000介绍

The Applied Materials P5000 is the most flexible, successful, single-wafer, multi-chamber CVD and etch system for manufacturing complex devices in high-volume production. As the licensed manufacturer of the P5000, we provides new and refurbished P5000 CVD and Etch systems, technical support, and software licensing as well as upgrades including chamber additions, upgrade kits, and enhancements.

Applications

• Discretes

• MEMS

• Optoelectronics

• Packaging

• Advanced Packaging

Processes P5000 Etch

• Silicon Oxide

• Silicon Nitride

• Oxynitride RIE

Features:

• 1 – 4 Chambers: Universal Lamp Heated CVD, MxP Etch, MxP+ Etch, eMxP, ASP Asher, Wafer Orienter

• Large install base of volume production tools

• Standard processes for silicon oxide and nitride

• Available 75 to 200 mm wafer transport

• Substrate Handling: 75mm – 200mm SiC, Sapphire, Quartz, Ge, GaAs, GaN, Silicon

• Bipolar Ceramic ESC

• Transparent Wafer

• Orienter GEMS Interface for Factory Automation

Benefits:

• Proven reliability

• Better process control and repeatability = Higher Yield

• Enhanced factory automation support

• Reliable and production proven processes for dielectric etch

Excellent value proposition for 75mm, 100mm, 150mm & 200mm